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Characterization of Ge Films on Si(001) Substrates Grown by Nanocontact Epitaxy

Ikeda, Wataru; Nakamura, Yoshiaki; Okamoto, Shogo; Takeuchi, Shotaro; Kikkawa, Jun; Ichikawa, Masakazu; Sakai, Akira

期刊名称Japanese Journal of Applied Physics
作者Ikeda, Wataru; Nakamura, Yoshiaki; Okamoto, Shogo; Takeuchi, Shotaro; Kikkawa, Jun; Ichikawa, Masakazu; Sakai, Akira
卷第52卷
印刷ISSN0021-4922
电子ISSN1347-4065
文件大小438.96KB
发表时间2013-09-01
DOI10.7567/jjap.52.095503