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Secondary Electrons in EUV Lithography

Secondary Electrons in EUV Lithography

Torok, Justin; Re, Ryan Del; Herbol, Henry; Das, Sanjana; Bocharova, Irina; Paolucci, Angela; Ocola, Leonidas E.; Ventrice Jr., Carl; Lifshin, Eric; Denbeaux, Greg; Brainard, Robert L.
  • 期刊名称Journal of Photopolymer Science and Technology
  • 作者Torok, Justin; Re, Ryan Del; Herbol, Henry; Das, Sanjana; Bocharova, Irina; Paolucci, Angela; Ocola, Leonidas E.; Ventrice Jr., Carl; Lifshin, Eric; Denbeaux, Greg; Brainard, Robert L.
  • 卷第26卷
  • 期第5期
  • 印刷ISSN0914-9244
  • 电子ISSN1349-6336
  • 文件大小362.70KB
  • 发表时间2013
  • DOI10.2494/photopolymer.26.625
  • 页码625-634
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