Engineering of the Chemical Reactivity of the Ti/HfO
<sub/>2</sub>
Interface for RRAM: Experiment and Theory.

Engineering of the Chemical Reactivity of the Ti/HfO ₂ Interface for RRAM: Experiment and Theory.

Calka, Pauline; Sowinska, Malgorzata; Bertaud, Thomas; Walczyk, Damian; Dabrowski, Jarek; Zaumseil, Peter; Walczyk, Christian; Gloskovskii, Andrei; Cartoixà, Xavier; Suñé, Jordi; Schroeder, Thomas

期刊名称ACS Applied Materials & Interfaces
作者Calka, Pauline; Sowinska, Malgorzata; Bertaud, Thomas; Walczyk, Damian; Dabrowski, Jarek; Zaumseil, Peter; Walczyk, Christian; Gloskovskii, Andrei; Cartoixà, Xavier; Suñé, Jordi; Schroeder, Thomas
卷第6卷
期第7期
印刷ISSN1944-8244
电子ISSN1944-8252
文件大小2449.13KB
发表时间2014-04-09
DOI10.1021/am500137y
页码5056-5060

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Engineering of the Chemical Reactivity of the Ti/HfO 2 Interface for RRAM: Experiment and Theory.

Engineering of the Chemical Reactivity of the Ti/HfO ₂ Interface for RRAM: Experiment and Theory.