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Enhanced selectivity over a photoresist film and process optimization for reactive ion etching of NiCr

Enhanced selectivity over a photoresist film and process optimization for reactive ion etching of NiCr

Gou, Jun; Wang, Jun; Tai, Huiling; Li, Weizhi; Gu, Deen; Jiang, Yadong

期刊名称Microelectronic Engineering
作者Gou, Jun; Wang, Jun; Tai, Huiling; Li, Weizhi; Gu, Deen; Jiang, Yadong
卷第113卷
印刷ISSN0167-9317
文件大小1060.72KB
发表时间2014-1
DOI10.1016/j.mee.2013.08.003
页码136-139

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