Basal Plane Dislocations from Inclusions in 4H-SiC Epitaxy
- 期刊名称Materials Science Forum
- 作者Stahlbush, Robert E.; Mahadik, Nadeemullah A.; O'Loughlin, Michael J.
- 电子ISSN1662-9752
- 文件大小1912.89KB
- 发表时间2014-2
- DOI10.4028/www.scientific.net/MSF.778-780.309
- 页码309-312
Fluorophosphine complexes of ruthenium and osmium. Part 3. Monomeric ruthenium(II) and osmium(II) halogeno-complexesHead, Robert A.; Nixon, John F. · Journal of the Chemical Society, Dalton Transactions · 1978
Fluorophosphine complexes of ruthenium and osmium. Part 1. Syntheses and stereochemistry of dihydrido-complexes of ruthenium(II) and osmium(II)Head, Robert A.; Nixon, John F. · Journal of the Chemical Society, Dalton Transactions · 1978
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Fluorophosphine complexes of ruthenium and osmium. Part 3. Monomeric ruthenium(II) and osmium(II) halogeno-complexesHead, Robert A.; Nixon, John F. · Journal of the Chemical Society, Dalton Transactions · 1978
Fluorophosphine complexes of ruthenium and osmium. Part 2. Reactions of dihydrido-complexes with protic speciesAl-Ohaly, Abdul Razzak; Head, Robert A.; Nixon, John F. · Journal of the Chemical Society, Dalton Transactions · 1978
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