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Damage Evaluation of Wet-Chemical Si-Wafer Thinning/Backside Via Exposure Process

Damage Evaluation of Wet-Chemical Si-Wafer Thinning/Backside Via Exposure Process

Watanabe, Naoya; Miyazaki, Takumi; Yoshikawa, Kazuhiro; Aoyagi, Masahiro
  • 期刊名称IEEE Transactions on Components, Packaging and Manufacturing Technology
  • 作者Watanabe, Naoya; Miyazaki, Takumi; Yoshikawa, Kazuhiro; Aoyagi, Masahiro
  • 卷第4卷
  • 期第4期
  • 印刷ISSN2156-3950
  • 电子ISSN2156-3985
  • 文件大小4335.01KB
  • 发表时间2014-4
  • DOI10.1109/tcpmt.2014.2304462
  • 页码741-747
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