SPIE Proceedings [SPIE SPIE MOEMS-MEMS - San Francisco, California, United States (Saturday 1 February 2014)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII - Emission-enhanced plasmonic substrates fabricated by nano-imprint lithography
von Freymann, Georg; Schoenfeld, Winston V.; Rumpf, Raymond C.; Choi, Bongseok; Iwanaga, Masanobu; Miyazaki, Hideki T.; Sakoda, Kazuaki; Sugimoto, Yoshimasa
- 作者von Freymann, Georg; Schoenfeld, Winston V.; Rumpf, Raymond C.; Choi, Bongseok; Iwanaga, Masanobu; Miyazaki, Hideki T.; Sakoda, Kazuaki; Sugimoto, Yoshimasa
- 卷第8974卷
- 印刷ISSN0277-786X
- 文件大小807.47KB
- 发表时间2014
- DOI10.1117/12.2037190