SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Design-Process-Technology Co-optimization for Manufacturability VIII - Yield-aware decomposition for LELE double patterning
Sturtevant, John L.; Capodieci, Luigi; Kohira, Yukihide; Yokoyama, Yoko; Kodama, Chikaaki; Takahashi, Atsushi; Nojima, Shigeki; Tanaka, Satoshi
- 作者Sturtevant, John L.; Capodieci, Luigi; Kohira, Yukihide; Yokoyama, Yoko; Kodama, Chikaaki; Takahashi, Atsushi; Nojima, Shigeki; Tanaka, Satoshi
- 卷第9053卷
- 印刷ISSN0277-786X
- 文件大小213.77KB
- 发表时间2014
- DOI10.1117/12.2046180