ChemInform Abstract: Ruthenium Complexes as Precursors for Chemical Vapor-Deposition (CVD)
- 期刊名称ChemInform
- 作者Gaur, Ruchi; Mishra, Lallan; Siddiqi, M. Aslam; Atakan, Burak
- 卷第45卷
- 期第48期
- 印刷ISSN0931-7597
- 文件大小11.85KB
- 发表时间2014-12-02
- DOI10.1002/chin.201448224
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