Influence of Temperature Program during Deposition on Properties of RF-Sputtered β-FeSi2 Films
- 期刊名称Transactions of the Materials Research Society of Japan
- 作者Uematsu, T.; Nishikawa, Y.; Nakamura, K.
- 卷第39卷
- 期第3期
- 印刷ISSN1382-3469
- 电子ISSN2188-1650
- 文件大小1244.58KB
- 发表时间2014
- DOI10.14723/tmrsj.39.353
- 页码353-356
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