Self-Aligned Colloidal Lithography for Controllable and Tuneable Plasmonic Nanogaps
- 期刊名称Small
- 作者Ding, Tao; Herrmann, Lars O.; de Nijs, Bart; Benz, Felix; Baumberg, Jeremy J.
- 卷第11卷
- 期第18期
- 印刷ISSN1613-6810
- 文件大小1012.22KB
- 发表时间2015-05
- DOI10.1002/smll.201402639
- 页码2139-2143