[IEEE 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) - Bologna, Italy (2015.1.26-2015.1.28)] EUROSOI-ULIS 2015: 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon - Band structure of III-V thin films: An atomistic study of non-parabolic effects in confinement direction
Mugny, G.; Triozon, F.; Li, J.; Niquet, Y.-M.; Hiblot, G.; Rideau, D.; Delerue, C.
- 作者Mugny, G.; Triozon, F.; Li, J.; Niquet, Y.-M.; Hiblot, G.; Rideau, D.; Delerue, C.
- 文件大小510.84KB
- 发表时间2015
- DOI10.1109/ulis.2015.7063833
- 页码301-304