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Influence of Process Parameters on the Properties of TiO<sub>2</sub> Films Deposited by a D.C. Magnetron Sputtering System on Glass Support

Influence of Process Parameters on the Properties of TiO₂ Films Deposited by a D.C. Magnetron Sputtering System on Glass Support

S. L. Toma; C. Bejinariu; E. Lucian; I. G. Sandu; B. F. Toma

作者S. L. Toma; C. Bejinariu; E. Lucian; I. G. Sandu; B. F. Toma
文件大小905.25KB
发表时间2015
DOI10.4028/www.scientific.net/KEM.660.86

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