SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Design-Process-Technology Co-optimization for Manufacturability IX - A new lithography hotspot detection framework based on AdaBoost classifier and simplified feature extraction
- 作者Sturtevant, John L.; Capodieci, Luigi; Matsunawa, Tetsuaki; Gao, Jhih-Rong; Yu, Bei; Pan, David Z.
- 卷第9427卷
- 印刷ISSN0277-786X
- 文件大小892.28KB
- 发表时间2015
- DOI10.1117/12.2085790
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