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[IEEE 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) - Bologna, Italy (2015.1.26-2015.1.28)] EUROSOI-ULIS 2015: 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon - Electron relaxation times and resistivity in metallic nanowires due to tilted grain boundary planes

[IEEE 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) - Bologna, Italy (2015.1.26-2015.1.28)] EUROSOI-ULIS 2015: 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon - Electron relaxation times and resistivity in metallic nanowires due to tilted grain boundary planes

Moors, Kristof; Soree, Bart; Tokei, Zsolt; Magnus, Wim
  • 作者Moors, Kristof; Soree, Bart; Tokei, Zsolt; Magnus, Wim
  • 文件大小260.55KB
  • 发表时间2015
  • DOI10.1109/ulis.2015.7063748
  • 页码201-204
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