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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Optical proximity correction with hierarchical Bayes model

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Optical proximity correction with hierarchical Bayes model

Lai, Kafai; Erdmann, Andreas; Matsunawa, Tetsuaki; Yu, Bei; Pan, David Z.
  • 作者Lai, Kafai; Erdmann, Andreas; Matsunawa, Tetsuaki; Yu, Bei; Pan, David Z.
  • 卷第9426卷
  • 印刷ISSN0277-786X
  • 文件大小711.97KB
  • 发表时间2015
  • DOI10.1117/12.2085787
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