[IEEE 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) - Bologna, Italy (2015.1.26-2015.1.28)] EUROSOI-ULIS 2015: 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon - Modeling of OxRAM variability from low to high resistance state using a stochastic trap assisted tunneling-based resistor network
Garbin, Daniele; Rafhay, Quentin; Vianello, Elisa; Jeannot, Simon; Candelier, Philippe; DeSalvo, Barbara; Ghibaudo, Gerard; Perniola, Luca
- 作者Garbin, Daniele; Rafhay, Quentin; Vianello, Elisa; Jeannot, Simon; Candelier, Philippe; DeSalvo, Barbara; Ghibaudo, Gerard; Perniola, Luca
- 文件大小1086.44KB
- 发表时间2015
- DOI10.1109/ulis.2015.7063789
- 页码125-128