[IEEE 2015 IEEE 11th International Conference on ASIC (ASICON ) - Chengdu, China (2015.11.3-2015.11.6)] 2015 IEEE 11th International Conference on ASIC (ASICON) - Effect of field implantation on off- and on-state characteristics for thin layer SOI field P-channel LDMOS
- 作者Zhou, Xin; Qiao, Ming; Li, Yang; Li, Zhaoji; Zhang, Bo
- 文件大小518.07KB
- 发表时间2015
- DOI10.1109/asicon.2015.7517069
- 页码1-4
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