[IEEE 2016 29th International Conference on VLSI Design and 2016 15th International Conference on Embedded Systems (VLSID) - Kolkata, India (2016.1.4-2016.1.8)] 2016 29th International Conference on VLSI Design and 2016 15th International Conference on Embedded Systems (VLSID) - Al/HfO2/Si Gate Stack with Improved Physical and Electrical Parameters

• 作者Prasher, Rakesh; Dass, Devi; Vaid, Rakesh
• 文件大小261.66KB
• 发表时间2016
• DOI10.1109/VLSID.2016.71
• 页码334-337