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Effect of argon gas pressure on residual stress, microstructure evolution and electrical resistivity of beryllium films

Effect of argon gas pressure on residual stress, microstructure evolution and electrical resistivity of beryllium films

Luo, Bing-Chi; Li, Kai; Zhang, Ji-Qiang; Luo, Jiang-Shan; Wu, Wei-Dong; Tang, Yong-Jian
  • 期刊名称Journal of the Korean Physical Society
  • 作者Luo, Bing-Chi; Li, Kai; Zhang, Ji-Qiang; Luo, Jiang-Shan; Wu, Wei-Dong; Tang, Yong-Jian
  • 卷第68卷
  • 期第4期
  • 印刷ISSN0374-4884
  • 电子ISSN1976-8524
  • 文件大小615.34KB
  • 发表时间2016-2
  • DOI10.3938/jkps.68.557
  • 页码557-562
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