Yield-aware mask assignment by positive semidefinite relaxation in triple patterning using cut process
- 期刊名称Journal of Micro/Nanolithography, MEMS, and MOEMS
- 作者Kohira, Yukihide; Kodama, Chikaaki; Matsui, Tomomi; Takahashi, Atsushi; Nojima, Shigeki; Tanaka, Satoshi
- 卷第15卷
- 期第2期
- 印刷ISSN1932-5150
- 文件大小724.85KB
- 发表时间2016-03-11
- DOI10.1117/1.jmm.15.2.021207
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