Laplacian eigenmaps- and Bayesian clustering-based layout pattern sampling and its applications to hotspot detection and optical proximity correction
- 期刊名称Journal of Micro/Nanolithography, MEMS, and MOEMS
- 作者Matsunawa, Tetsuaki; Yu, Bei; Pan, David Z.
- 卷第15卷
- 期第4期
- 印刷ISSN1932-5150
- 文件大小1334.26KB
- 发表时间2016-10-21
- DOI10.1117/1.JMM.15.4.043504
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