Uneven Distribution of Silicon Crystalline Grains in RF-Sputtered β-FeSi2 Films Deposited on Off-Oriented Silicon Substrate
- 期刊名称Transactions of the Materials Research Society of Japan
- 作者Uematsu, T.; Nakamura, K.
- 卷第41卷
- 期第1期
- 印刷ISSN1382-3469
- 电子ISSN2188-1650
- 文件大小876.54KB
- 发表时间2016
- DOI10.14723/tmrsj.41.97
- 页码97-100
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