Effect of Rapid Thermal Annealing on the Structural Evolution and Electrical Property of Gold Films Deposited on Silicon
- 期刊名称Key Engineering Materials
- 作者Janardhanam, V.; Choi, Chel Jong
- 卷第730卷
- 电子ISSN1662-9795
- 文件大小394.40KB
- 发表时间2017-2
- DOI10.4028/www.scientific.net/kem.730.97
- 页码97-101
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