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Controlled defect creation and removal in graphene and MoS
<sub/>2</sub>
monolayers

Controlled defect creation and removal in graphene and MoS ₂ monolayers

Li, D.W.; Zou, Q.M.; Rabiee-Golgir, H.; Keramatnejad, Kamran; Huang, Xi; Song, Jingfeng; Xiao, Zhiyong; Fan, Lisha; Hong, Xia; Jiang, Lan; silvain, jean-françois; Sun, Shuo; Lu, Yong-Feng

期刊名称Nanoscale
作者Li, D.W.; Zou, Q.M.; Rabiee-Golgir, H.; Keramatnejad, Kamran; Huang, Xi; Song, Jingfeng; Xiao, Zhiyong; Fan, Lisha; Hong, Xia; Jiang, Lan; silvain, jean-françois; Sun, Shuo; Lu, Yong-Feng
印刷ISSN2040-3364
电子ISSN2040-3372
文件大小2687.21KB
发表时间2017
DOI10.1039/c7nr01712j

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