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Influence of substrate movement on the ITO film thickness distribution during magnetron sputtering

Influence of substrate movement on the ITO film thickness distribution during magnetron sputtering

Starkov, Ivan A.; Nyapshaev, Ilya A.; Starkov, Alexander S.; Abolmasov, Sergey N.; Abramov, Alexey S.; Levitskii, Vladimir S.; Terukov, Evgeny I.
  • 期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
  • 作者Starkov, Ivan A.; Nyapshaev, Ilya A.; Starkov, Alexander S.; Abolmasov, Sergey N.; Abramov, Alexey S.; Levitskii, Vladimir S.; Terukov, Evgeny I.
  • 卷第35卷
  • 期第6期
  • 印刷ISSN0734-2101
  • 电子ISSN1520-8559
  • 文件大小774.15KB
  • 发表时间2017-11
  • DOI10.1116/1.4991527
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