Influence of substrate movement on the ITO film thickness distribution during magnetron sputtering
Starkov, Ivan A.; Nyapshaev, Ilya A.; Starkov, Alexander S.; Abolmasov, Sergey N.; Abramov, Alexey S.; Levitskii, Vladimir S.; Terukov, Evgeny I.
- 期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
- 作者Starkov, Ivan A.; Nyapshaev, Ilya A.; Starkov, Alexander S.; Abolmasov, Sergey N.; Abramov, Alexey S.; Levitskii, Vladimir S.; Terukov, Evgeny I.
- 卷第35卷
- 期第6期
- 印刷ISSN0734-2101
- 电子ISSN1520-8559
- 文件大小774.15KB
- 发表时间2017-11
- DOI10.1116/1.4991527