Low surface damage dry etched black silicon
- 期刊名称Journal of Applied Physics
- 作者Plakhotnyuk, Maksym M.; Gaudig, Maria; Davidsen, Rasmus Schmidt; Lindhard, Jonas Michael; Hirsch, Jens; Lausch, Dominik; Schmidt, Michael Stenbæk; Stamate, Eugen; Hansen, Ole
- 卷第122卷
- 期第14期
- 印刷ISSN0021-8979
- 电子ISSN1089-7550
- 文件大小4552.77KB
- 发表时间2017-10-14
- DOI10.1063/1.4993425
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