Direct evaluation of electrical dipole moment and oxygen density ratio at high-
k
dielectrics/SiO
2
interface by X-ray photoelectron spectroscopy analysis
Fujimura, Nobuyuki; Ohta, Akio; Ikeda, Mitsuhisa; Makihara, Katsunori; Miyazaki, Seiichi
- 期刊名称Japanese Journal of Applied Physics
- 作者Fujimura, Nobuyuki; Ohta, Akio; Ikeda, Mitsuhisa; Makihara, Katsunori; Miyazaki, Seiichi
- 卷第57卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小1889.22KB
- 发表时间2018-04-01
- DOI10.7567/JJAP.57.04FB07