Microstructure evolution and grain orientation in ITO targets and their effects on the film characteristics
- 期刊名称Journal of Materials Science: Materials in Electronics
- 作者Mei, Fangsheng; Yuan, Tiechui; Li, Ruidi; Qin, Kai; Huang, Jingwei
- 印刷ISSN0957-4522
- 电子ISSN1573-482X
- 文件大小7094.54KB
- 发表时间2018-7-6
- DOI10.1007/s10854-018-9598-7
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