Stochastic simulation of pattern formation in electron beam lithography
- 期刊名称Journal of Vacuum Science & Technology B
- 作者Yasuda, Masaaki; Koyama, Masanori; Shirai, Masamitsu; Kawata, Hiroaki; Hirai, Yoshihiko
- 卷第36卷
- 期第6期
- 印刷ISSN2166-2746
- 电子ISSN2166-2754
- 文件大小2483.69KB
- 发表时间2018-11
- DOI10.1116/1.5049757
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