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[IEEE 2019 Symposium on VLSI Technology - Kyoto, Japan (2019.6.9-2019.6.14)] 2019 Symposium on VLSI Technology - Comprehensive Scaling Study on 3D Cross-Point PCM toward 1Znm Node for SCM Applications

[IEEE 2019 Symposium on VLSI Technology - Kyoto, Japan (2019.6.9-2019.6.14)] 2019 Symposium on VLSI Technology - Comprehensive Scaling Study on 3D Cross-Point PCM toward 1Znm Node for SCM Applications

Chien, W.C.; Ho, H.Y.; Yeh, C.W.; Yang, C.H.; Cheng, H.Y.; Kim, W.; Kuo, I.T.; Gignac, L.M.; Lai, E.K.; Gong, N.; Chou, Y.C.; Cheng, C.W.; Lin, Y.F.; Papalia, J.M.; Carta, F.; Rav, A.; Bruce, R.L.; Briahtxky, M.; Lung, H.L.
  • 作者Chien, W.C.; Ho, H.Y.; Yeh, C.W.; Yang, C.H.; Cheng, H.Y.; Kim, W.; Kuo, I.T.; Gignac, L.M.; Lai, E.K.; Gong, N.; Chou, Y.C.; Cheng, C.W.; Lin, Y.F.; Papalia, J.M.; Carta, F.; Rav, A.; Bruce, R.L.; Briahtxky, M.; Lung, H.L.
  • 文件大小3170.58KB
  • 发表时间2019
  • DOI10.23919/VLSIT.2019.8776516
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