![SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 29 July 2001)] Charged Particle Detection, Diagnostics, and Imaging - <title>Aberration correction for charged particle lithography</title>]()
SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 29 July 2001)] Charged Particle Detection, Diagnostics, and Imaging - <title>Aberration correction for charged particle lithography</title>Munro, Eric; Zhu, Xieqing; Rouse, John A.; Liu, Haoning; Delage, Olivier; Munro, Eric; Rouse, John A. · 2001