![Resist Design Considerations for Direct Write and Projection Electron-Beam Lithography Technologies.]()
Resist Design Considerations for Direct Write and Projection Electron-Beam Lithography Technologies.Novembre, Anthony E.; Tarascon, Regine G.; Berger, Steven D.; Biddick, Chris J.; Blakey, Myrtle I.; Bolan, Kevin J.; Fetter, Linus A.; Harriott, Lloyd R.; Huggins, Harold A.; Knurek, Chester S.; Liddle, J. Alexander; Mixon, David A.; Peabody, Milton L. · Journal of Photopolymer Science and Technology · 1996