![SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - <title>Dissolution characteristics optimization for chemically amplified positive resist</title>]()
SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - <title>Dissolution characteristics optimization for chemically amplified positive resist</title>Itani, Toshiro; Iwasaki, Haruo; Fujimoto, Masashi; Kasama, Kunihiko; Nalamasu, Omkaram · 1994