![SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - <title>Picosecond Electron-Beam And Synchrotron Radiation Pulse Radiolysis For Studies On Electron-Beam And X-Ray Resists</title>]()
SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - <title>Picosecond Electron-Beam And Synchrotron Radiation Pulse Radiolysis For Studies On Electron-Beam And X-Ray Resists</title>Yoshida, Yoichi; Shibata, Hiromi; Tagawa, Seiichi; Washio, Masakazu; Tabata, Yoneho; Kouchi, Noriyuki; Ogata, Atsushi; Reichmanis, Elsa · 1989