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Electrical Characteristics and Thermal Stability of W, WN[sub x], and TiN Barriers in Metal/Ta[sub 2]O[sub 5]/Si Gate Devices

Electrical Characteristics and Thermal Stability of W, WN[sub x], and TiN Barriers in Metal/Ta[sub 2]O[sub 5]/Si Gate Devices

Lee, Joo Wan; Han, Chang Hee; Park, Ji-Soo; Park, Jin Won

期刊名称Journal of The Electrochemical Society
作者Lee, Joo Wan; Han, Chang Hee; Park, Ji-Soo; Park, Jin Won
卷第148卷
期第3期
印刷ISSN0013-4651
文件大小187.59KB
发表时间2001
DOI10.1149/1.1346613

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