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[IEEE kshop on Junction Technology - Osaka, Japan (2005.06.7-2005.06.8)] Extended Abstracts of the Fifth International Workshop on Junction Technology - Properties of ion-implanted strained-Si/SiGe heterostructures

[IEEE kshop on Junction Technology - Osaka, Japan (2005.06.7-2005.06.8)] Extended Abstracts of the Fifth International Workshop on Junction Technology - Properties of ion-implanted strained-Si/SiGe heterostructures

Sugii, N.; Morioka, J.; Ishidoya, Y.; Koyama, K.; Inada, T.
  • 作者Sugii, N.; Morioka, J.; Ishidoya, Y.; Koyama, K.; Inada, T.
  • 文件大小2444.06KB
  • 发表时间2005
  • DOI10.1109/iwjt.2005.203866
  • 页码11-14
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