![[ECS 208th ECS Meeting - Los Angeles, California (October 16-October 21, 2005)] ECS Transactions - Prospect of Hf-Based Gate Dielectric by PVD with FUSI Gate for LSTP Application]()
[ECS 208th ECS Meeting - Los Angeles, California (October 16-October 21, 2005)] ECS Transactions - Prospect of Hf-Based Gate Dielectric by PVD with FUSI Gate for LSTP ApplicationNiwa, Masaaki; Mitsuhashi, Riichirou; Hayashi, Shigenori; Yamamoto, Kazuhiko; Harada, Yoshinao; Kubota, Masafumi; Rothchild, Aude; Hoffmann, Thomas; Kubicek, Stefan; De Gendt, S.; Heyns, Marc; Lauwers, Anne; Biesemans, Serge; Kittle, Jorge · 2006