[IEEE 2006 International Workshop on Junction Technology - Shanghai, China (15-16 May 2006)] 2006 International Workshop on Junction Technology - Feasibility Study of Solid-phase Epitaxial Regrowth (SPER) as an Ultra-shallow Junction (USJ) Technology for High-performance CMOS DevicesMiyashita, T.; Ookoshi, K.; Okabe, K.; Minakata, H.; Suzuki, K.; Aoyama, T. · 2006