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Plasma-assisted atomic layer deposition of Ta[sub 2]O[sub 5] from alkylamide precursor and remote O[sub 2] plasma

Plasma-assisted atomic layer deposition of Ta[sub 2]O[sub 5] from alkylamide precursor and remote O[sub 2] plasma

Heil, S. B. S.; Roozeboom, F.; van de Sanden, M. C. M.; Kessels, W. M. M.

期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
作者Heil, S. B. S.; Roozeboom, F.; van de Sanden, M. C. M.; Kessels, W. M. M.
卷第26卷
期第3期
印刷ISSN0734-2101
文件大小787.11KB
发表时间2008
DOI10.1116/1.2905250

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