![SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Monitoring and control of photoresist properties and CD during photoresist processing]()
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Monitoring and control of photoresist properties and CD during photoresist processingYang, Geng; Raymond, Christopher J.; Ngo, Yit-Sung; Putra, Andi S.; Ang, Kar-Tien; Tay, Arthur; Fang, Zhong-Ping · 2010