![SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - <title>Systematic investigation of the photoresponse and dissolution characteristics of an acid-hardening resist</title>]()
SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - <title>Systematic investigation of the photoresponse and dissolution characteristics of an acid-hardening resist</title>Das, Siddhartha; Thackeray, James W.; Endo, Masayuki; Langston, Joseph C.; Gaw, Henry T.; Watts, Michael P. C. · 1990