![[IEEE International Technical Digest on Electron Devices Meeting - Washington, DC, USA (3-6 Dec. 1989)] International Technical Digest on Electron Devices Meeting - Single crystal aluminum lines with excellent endurance against stress induced failure]()
[IEEE International Technical Digest on Electron Devices Meeting - Washington, DC, USA (3-6 Dec. 1989)] International Technical Digest on Electron Devices Meeting - Single crystal aluminum lines with excellent endurance against stress induced failureHasunuma, M.; Kaneko, H.; Sawabe, A.; Kawanoue, T.; Kohanawa, Y.; Komatsu, S.; Miyauchi, M. · 1989