![Etching mechanism of (Ba, Sr)TiO[sub 3] films in high density Cl[sub 2]/BCl[sub 3]/Ar plasma]()
Etching mechanism of (Ba, Sr)TiO[sub 3] films in high density Cl[sub 2]/BCl[sub 3]/Ar plasmaKim, Seung-Bum; Lee, Yong-Hyuk; Kim, Tae-Hyung; Yeom, Geun-Young; Kim, Chang-Il · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 2000