![SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - <title>First performance results of the ASML alpha demo tool</title>]()
SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - <title>First performance results of the ASML alpha demo tool</title>Meiling, Hans; Meijer, Henk; Banine, Vadim; Moors, Roel; Groeneveld, Rogier; Voorma, Harm-Jan; Mickan, Uwe; Wolschrijn, Bas; Mertens, Bas; van Baars, Gregor; Kürz, Peter; Harned, Noreen; Lercel, Michael J. · 2006