![SPIE Proceedings [SPIE SPIE MOEMS-MEMS - San Francisco, California, USA (Saturday 21 January 2012)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V - Sub-micrometer pattern generation by diffractive mask-aligner lithography]()
SPIE Proceedings [SPIE SPIE MOEMS-MEMS - San Francisco, California, USA (Saturday 21 January 2012)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V - Sub-micrometer pattern generation by diffractive mask-aligner lithographyZeitner, Uwe D.; Stuerzebecher, Lorenz; Harzendorf, Torsten; Fuchs, Frank; Michaelis, Dirk; Schoenfeld, Winston V.; Rumpf, Raymond C.; von Freymann, Georg · 2012