![Complementary Metal–Oxide–Silicon Field-Effect-Transistors Featuring Atomically Flat Gate Insulator Film/Silicon Interface]()
Complementary Metal–Oxide–Silicon Field-Effect-Transistors Featuring Atomically Flat Gate Insulator Film/Silicon InterfaceKuroda, Rihito; Teramoto, Akinobu; Nakao, Yukihisa; Suwa, Tomoyuki; Konda, Masahiro; Hasebe, Rui; Li, Xiang; Isogai, Tatsunori; Tanaka, Hiroaki; Sugawa, Shigetoshi; Ohmi, Tadahiro · Japanese Journal of Applied Physics · 2009