Observation of silicon front surface topographs of an ultralarge-scale-integrated wafer by synchrotron x-ray plane wave
- 期刊名称Journal of Applied Physics
- 作者Suzuki, Yoshifumi; Tsukasaki, Yoshimitsu; Kajiwara, Kentaro; Kawado, Seiji; Iida, Satoshi; Chikaura, Yoshinori
- 卷第96卷
- 期第11期
- 印刷ISSN0021-8979
- 文件大小448.63KB
- 发表时间2004
- DOI10.1063/1.1812354
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