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Investigation of the implanted phosphorus in a boron doped SiGe epitaxial layer

Investigation of the implanted phosphorus in a boron doped SiGe epitaxial layer

R. Kinder; A. Vincze; M. Kuruc; R. Srnánek; B. Lojek; B. Sopko; D. Chren
  • 作者R. Kinder; A. Vincze; M. Kuruc; R. Srnánek; B. Lojek; B. Sopko; D. Chren
  • 卷第37卷
  • 期第7期
  • 印刷ISSN0026-2692
  • 文件大小159.20KB
  • 发表时间2006
  • DOI10.1016/j.mejo.2005.07.010
  • 页码642-645
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