![SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - <title>Quantitative stepper metrology using the focus monitor test mask</title>]()
SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - <title>Quantitative stepper metrology using the focus monitor test mask</title>Brunner, Timothy A.; Martin, Alexander L.; Martino, Ronald M.; Ausschnitt, Christopher P.; Newman, Thomas H.; Hibbs, Michael S.; Brunner, Timothy A. · 1994